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The Apollonis a single wafer system which is designed to effectively clean, etch and remove polymers in FEOL, BEOL and advanced package of the semiconductor manufacturing process.

- Field proven performance (≤ 20nm)
- All in one process (chemical, rinse, and dry in one chamber)
- Flexible configuration (1, 2, 4, 8 chambers)
- SEMI S2 standard compliant
- Small footprint (2200(W) x 3950(D) x 2600(H) –8CHBs)


- Cleaning in FEOL or BEOL
- Metal etching in WLP (Wet etch for Cu, Ti, Au)
- PR Stripping in WLP

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