MSP - 2300G3
- 10nm advanced deposition capability
- Spot, Ring, and Arc pattern deposits anywhere on wafer with controllable width
- Full wafer (blanket) deposits with high spatial uniformity
- Cluster-free deposition of PSL spheres and SiO2 spheres
- Highly accurate control of deposited particle peak diameter
- Control of deposited particle size distribution width
- Accurate control of deposited particle count
- Fully-automated recipe-based deposition control
- Deposition of up to 16 different particle suspensions with one recipe
- Automated measurement and detailed analysis of particle suspension size distributions
- Standard manually-loaded version supports 150mm, 200mm, 300mm wafers
- Optional automated version supports automatic loading of 200mm and 300mm wafers
- Deposition and Suspension Analysis report generation and exporting
- Produce countless particle wafer standards in house at lower cost than standards provided by an
outside supplier
- Minimize turn-around time of particle depositions
- Protect valuable intellectual property by depositing particles on proprietary films in house
- Minimize risk of contamination by producing particle wafer standards in house
- Increase device fabrication process yield with properly calibrated inspection tools and optimized
substrate cleaning processes
- Spot, Ring, and Arc pattern deposits anywhere on wafer with controllable width
- Full wafer (blanket) deposits with high spatial uniformity
- Cluster-free deposition of PSL spheres and SiO2 spheres
- Highly accurate control of deposited particle peak diameter
- Control of deposited particle size distribution width
- Accurate control of deposited particle count
- Fully-automated recipe-based deposition control
- Deposition of up to 16 different particle suspensions with one recipe
- Automated measurement and detailed analysis of particle suspension size distributions
- Standard manually-loaded version supports 150mm, 200mm, 300mm wafers
- Optional automated version supports automatic loading of 200mm and 300mm wafers
- Deposition and Suspension Analysis report generation and exporting
- Produce countless particle wafer standards in house at lower cost than standards provided by an
outside supplier
- Minimize turn-around time of particle depositions
- Protect valuable intellectual property by depositing particles on proprietary films in house
- Minimize risk of contamination by producing particle wafer standards in house
- Increase device fabrication process yield with properly calibrated inspection tools and optimized
substrate cleaning processes
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